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ALN 10*10mm2 AlN Single Crystal 400±50μM S/P/R Grade

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ALN 10*10mm2 AlN Single Crystal 400±50μM S/P/R Grade

ALN 10*10mm2 AlN Single Crystal 400±50μM S/P/R Grade
ALN 10*10mm2 AlN Single Crystal 400±50μM S/P/R Grade

Large Image :  ALN 10*10mm2 AlN Single Crystal 400±50μM S/P/R Grade

Product Details:
Brand Name: GaNova
Model Number: JDCD02-001-004
Payment & Shipping Terms:
Minimum Order Quantity: 1
Packaging Details: Vacuum packing in a class 10000 clean room environment,in cassettes of 25pcs or single wafer containers.
Payment Terms: T/T

ALN 10*10mm2 AlN Single Crystal 400±50μM S/P/R Grade

Description
Diameter: 10mmx10mm Thickness(μm): 400±50
Crystal Form: 2H Polytype: {0001}±0.5°
Roughness: Al Face:≤0.5nm N Face(back):≤1.2μm Surface Polishing: Aluminum Surface: Chemical Polishing (double
Highlight:

ALN aluminum nitride wafer

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2H aluminum nitride wafer

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10*10mm2 aln wafer

AlN substrate is one of the most popular ceramic substrate which has excellent heat resistance, high mechnical strength , abrasion resistance and small dielectric loss . The surface of AlN substrate is quite smooth and low porosity . Aluminium Nitride has higher thermal conductivity , compared to alumina substrate , It is about 7 to 8 times high . AlN substrate is an excellent electronic package material .

A thin film of aluminum nitride is a layer of aluminum that is resistant to high temperatures. During high temperatures, this layer of aluminum will help protect the material. In high-pressure environments, it can be unstable. It can withstand a range of temperatures up to 980degC. At lower levels, it can be toxic to humans. It is also used in mobile phones. Its properties are extremely diverse.

 

 

10*10mm2 Aluminum nitride single crystal substrate
Crystal Specifications Parameter value
Diameter(mm) 10x10
Thickness(μm) 400±50
Crystal Form 2H
Polytype {0001}±0.5°
Surface polishing Aluminum surface: chemical polishing (double polishing can be customized)
Roughness

Al face:≤0.5nm

N face(back):≤1.2μm

appearance square shape
Quality grade S grade(Super) P grade(Prouduction) R grade(Research)
HRXRD Half height width@{0002}(arcsec) ≤150 ≤300 ≤500
HRXRD Half height width@{10-12}(arcsec) ≤100 ≤200 ≤400
absorption coefficient@265nm(cm-1) ≤50 ≤70 ≤100
Edge Exclusion(mm) 1 1 1
Indents
Chips ≤3 Cumulative ≤1.0mm
TUA ≥90%
TTV(μm) ≤30
Warp(μm) ≤30
Bow(μm) ≤30

Cracks

 

No, naked eye, strong light
Contamination No, naked eye, radiation
package Monolithic wafer box

 

About Us

We specialize in processing a variety of materials into wafers, substrates and customized optical glass parts.components widely used in electronics, optics, opto electronics and many other fields. We also have been working closely with many domestic and oversea universities, research institutions and companies, provide customized products and services for their R&D projects. It's our vision to maintaining a good relationship of cooperation with our all customers by our good reputations.

 

 

FAQ

Q: Are you trading company or manufacturer ?
We are factory.
Q: How long is your delivery time?
Generally it is 3-5 days if the goods are in stock.
or it is 7-10 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
Payment <=5000USD, 100% in advance.
Paymen >=5000USD, 80% T/T in advance , balance before shippment.

 

 

 

Contact Details
Shanghai GaNova Electronic Information Co., Ltd.

Contact Person: Xiwen Bai (Ciel)

Tel: +8613372109561

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