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SP-Face 11-12 Un-Doped N-Type Free-Standing GaN Single Crystal Substrate Resistivity 0.05 Ω·cm Macro Defect Density 0cm⁻²

5*10mm2 SP-face (11-12) Un-doped n-type free-standing GaN single crystal substrate Resistivity < 0.05 Ω·cm Power device/laser wafer Overview Because GaN transistors are able to turn on faster than silicon transistors, they are able to reduce the losses caused by this transition. Another way that GaN ... Read More
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JDCD10-001-002 2inch GaAs (100) Si Doped Substrates

2inch GaAs (100) Si-doped substrates Overview GaAs is often used as a substrate material for the epitaxial growth of other III-V semiconductors, including indium gallium arsenide, aluminum gallium arsenide and others. Gallium arsenide of a GaAs Wafer has the attribute of generating laser light from ... Read More
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JDCD10-001-003 2 inch GaAs(100) Zn Doped Substrates

2inch GaAs(100) Zn-doped substrates Overview Gallium arsenide of a GaAs Wafer has the attribute of generating laser light from electricity in a direct manner. There are two types of GaAs Wafer; polycrystalline and single crystal. These wafers are utilized in micro electronics and opto electronics ... Read More
buy JDCD10-001-004 2 Inch GaAs (111) Si Doped Substrates online manufacturer

JDCD10-001-004 2 Inch GaAs (111) Si Doped Substrates

2inch GaAs (111) Si-doped substrates Overview Gallium in a GaAs Wafer is in general used in the production of semiconductors, barometers, light emitting diodes, thermometers and electronic circuits. It is a silvery metal and quite soft which makes it easy to be used in chips as well. Gallium element... Read More
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JDCD10-001-005 2 Inch GaAs(111) Zn Doped Substrates

2inch GaAs(111) Zn-doped substrates Overview GaAs crystals can be created through three different methods. One of the more common methods is the vertical gradient freeze process, which involves growing crystals and slicing them, followed by edge rounding and polishing them into wafers. Another ... Read More
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JDCD04-001-007 10x10mm2(010)Sn-Doped Free-Standing Ga2O3 Single Crystal Substrate Product Grade Single Polishing

10x10mm2(010)Sn-doped free-standing Ga2O3 single crystal substrate Product grade single polishing Thickness 0.6~0.8mm FWHM<350arcsec,Ra≤0.5nm Resistance 1.53E+18Ω/cm-3 Optoelectronic devices, insulating layers of semiconductor materials, and UV filters While silicon-based devices have been able to ... Read More
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10x10mm2 100(off 6°) Fe-doped free-standing Ga2O3 single crystal substrate Product grade single polishing Thickness 0.6~0.8mm FWHM<350arcsec,Ra≤5nm Optoelectronic devices, insulating layers of semiconductor materials, and UV filters Power density is greatly improved in gallium nitride devices ... Read More
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JDCD04-001-002 10x10mm2 (-201) Sn-Doped Free-Standing Ga2O3 Single Crystal Substrate Product Grade Single Polishing

10x10mm2 (-201) Sn-doped free-standing Ga2O3 single crystal substrate Product grade single polishing Thickness 0.6~0.8mm FWHM<350arcsec,Ra≤0.3 nm Resistance Read More